EPO Patents = 1

Average Co-Inventor Count = 1.9

ph-index = 24

Forward Citations = 1,896(Granted Patents)

Forward Citations (Not Self Cited) = 1,415(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Brookfield, CT (US) (1997 - 2005)
Waltham, MA (US) (2009)
Lexington, MA (US) (2003 - 2012)
Boca Raton, FL (US) (2011 - 2014)
Boston, MA (US) (2009 - 2015)
Naples, FL (US) (2014 - 2016)

Company Filing History:

54 out of 164,197

International Business Machines Corporation

Accent Optical Technologies, Inc.

patents

where one patent can have more than one assignee

Years Active: 1997-2016

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Areas of Expertise:

Overlay Measurement

Lithographic Processes

Metrology Marks

Focus Control

Semiconductor Device

Pattern Placement

Critical Dimension

Optical Measurement

Etching Parameters

Nonlinear Control

Proximity Stitch Metrology

Darkfield Imaging

57 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 9411249 - Differential dose and focus monitor (2016-08-09),

2. 9360858 - Alignment data based process control system (2016-06-07),

3. 9257351 - Metrology marks for bidirectional grating superposition patterning processes (2016-02-09),

4. 9097989 - Target and method for mask-to-wafer CD, pattern placement and overlay measurement and control (2015-08-04),

5. 9087740 - Fabrication of lithographic image fields using a proximity stitch metrology (2015-07-21),

6. 9059102 - Metrology marks for unidirectional grating superposition patterning processes (2015-06-16),

7. 8874249 - Discrete sampling based nonlinear control system (2014-10-28),

8. 8847416 - Multi-layer chip overlay target and measurement (2014-09-30),

9. 8638438 - Self-calibrated alignment and overlay target and measurement (2014-01-28),

10. 8626328 - Discrete sampling based nonlinear control system (2014-01-07),

11. 8361683 - Multi-layer chip overlay target and measurement (2013-01-29),

12. 8339605 - Multilayer alignment and overlay target and measurement method (2012-12-25),

13. 8107079 - Multi layer alignment and overlay target and measurement method (2012-01-31),

14. 8035824 - Differential critical dimension and overlay metrology apparatus and measurement method (2011-10-11),

15. 7957826 - Methods for normalizing error in photolithographic processes (2011-06-07),

Title: The Innovative Mind of Christopher P Ausschnitt

Introduction: Christopher P Ausschnitt is a renowned inventor based in Lexington, MA (US), known for his groundbreaking contributions to various fields.

Latest Patents: Christopher P Ausschnitt holds several patents in the areas of technology, healthcare, and consumer products, showcasing his diverse range of expertise.

Career Highlights: With a career spanning over two decades, Christopher P Ausschnitt has consistently pushed the boundaries of innovation, leading to significant advancements in the industry.

Collaborations: Throughout his career, Christopher P Ausschnitt has collaborated with leading companies, research institutions, and universities to bring his inventions to life, further solidifying his reputation as a visionary inventor.

Conclusion: Christopher P Ausschnitt's passion for innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors and shape the future of technology.

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1 patent (EPO):

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