The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 16, 2015
Filed:
Aug. 15, 2013
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Christopher P. Ausschnitt, Naples, FL (US);
Nelson M. Felix, Briarcliff Manor, NY (US);
Scott D. Halle, Slingerlands, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/66 (2006.01); H01L 21/308 (2006.01); G03F 7/20 (2006.01); H01L 23/544 (2006.01);
U.S. Cl.
CPC ...
H01L 21/308 (2013.01); H01L 22/12 (2013.01); H01L 23/544 (2013.01); G03F 7/70633 (2013.01);
Abstract
Cut spacer reference marks, targets having such cut spacer reference marks, and methods of making the same by forming spacer gratings around grating lines on a first layer, and fabricating an angled template mask that extends across and resides at an angle with respect to such spacer gratings. Angled, cut spacer gratings are etched into a second layer using the angled template mask to superimpose at least a portion of the spacer gratings of the first layer into the second layer.