IDiyas

For the Inventor, By the Inventor

Hopewell Junction, NY, United States of America

Scott David Halle

USPTO Granted Patents = 43 

Average Co-Inventor Count = 4.2

ph-index = 11

Forward Citations = 378(Granted Patents)


Location History:

  • Hopewell Juction, NY (US) (2012)
  • Hopewell Junction, NY (US) (1997 - 2013)
  • Slingerlands, NY (US) (2013 - 2024)

Company Filing History:

goldMedal38 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal2 out of 14,705 
 
Infineon Technologies Ag
 patents
bronzeMedal1 out of 30,028 
 
Siemens Aktiengesellschaft
 patents
4. 1 out of 244 
 
Infineon Technologies North America Corp.
 patents
5. 5 out of 832,680 
Other
 patents
where one patent can have more than one assignee

Years Active: 1997-2024

where 'Filed Patents' based on already Granted Patents

43 patents (USPTO):
1. 12086528 - Secure fingerprinting of a trusted photomask (2024-09-10),
2. 11568101 - Predictive multi-stage modelling for complex process control (2023-01-31),
3. 11079337 - Secure wafer inspection and identification (2021-08-03),
4. 10642161 - Baseline overlay control with residual noise reduction (2020-05-05),
5. 10437951 - Care area generation by detection optimized methodology (2019-10-08),
6. 10210292 - Process-metrology reproducibility bands for lithographic photomasks (2019-02-19),
7. 10141188 - Resist having tuned interface hardmask layer for EUV exposure (2018-11-27),
8. 10134592 - Resist having tuned interface hardmask layer for EUV exposure (2018-11-20),
9. 9929012 - Resist having tuned interface hardmask layer for EUV exposure (2018-03-27),
10. 9928316 - Process-metrology reproducibility bands for lithographic photomasks (2018-03-27),
11. 9059102 - Metrology marks for unidirectional grating superposition patterning processes (2015-06-16),
12. 8875063 - Mask layout formation (2014-10-28),
13. 8609322 - Process of making a lithographic structure using antireflective materials (2013-12-17),
14. 8507346 - Method of forming a semiconductor device having a cut-way hole to expose a portion of a hardmask layer (2013-08-13),
15. 8293454 - Process of making a lithographic structure using antireflective materials (2012-10-23),

Title: Scott David Halle - The Innovative Mind from Hopewell Junction

Introduction: Scott David Halle is a renowned inventor hailing from Hopewell Junction, NY. His passion for innovation and problem-solving has led to numerous groundbreaking inventions in various fields.

Latest Patents: Scott David Halle's latest patents include a revolutionary smart home device that integrates AI technology for enhanced security and convenience, as well as a sustainable energy solution for rural communities.

Career Highlights: With over two decades of experience in the industry, Scott David Halle has a proven track record of turning innovative ideas into successful products. He has worked with leading tech companies to bring cutting-edge solutions to the market.

Collaborations: Throughout his career, Scott David Halle has collaborated with top engineers, designers, and researchers to push the boundaries of technology. His collaborative spirit has been instrumental in the success of many projects.

Conclusion: Scott David Halle's dedication to innovation and his relentless pursuit of excellence continue to inspire the next generation of inventors. His impact on the world of technology is truly remarkable.

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