The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 08, 2019

Filed:

Aug. 23, 2017
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Ravi K. Bonam, Albany, NY (US);

Nelson Felix, Briarcliff Manor, NY (US);

Scott Halle, Slingerlands, NY (US);

Luciana Meli, Albany, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); H01L 21/00 (2006.01); H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
G06F 17/505 (2013.01); G06F 17/5081 (2013.01); H01L 21/00 (2013.01); G06F 2217/08 (2013.01); G06F 2217/14 (2013.01); H01J 37/32009 (2013.01);
Abstract

A method comprises: defining a set of rules for an inspection and detection of a defect in two or more electronic devices on a semiconductor chip, the set of rules being based on a modulation transfer function providing a response as contrast versus spatial frequency of the pattern spacings of the two or more electronic devices on the semiconductor chip; generating two or more care areas for two or more pattern spacings of the electronic devices on the semiconductor chip using a hierarchical set of spacing rules; and inspecting the two or more pattern spacings of the electronic devices on the semiconductor chip for defects.


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