IDiyas

For the Inventor, By the Inventor

Briarcliff Manor, NY, United States of America

Nelson M Felix

USPTO Granted Patents = 78 

Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 74(Granted Patents)

DiyaCoin DiyaCoin = 0.06 


Inventors with similar research interests:


Location History:

  • Hopewell Junction, NY (US) (2013 - 2014)
  • Albany, NY (US) (2018 - 2019)
  • Braircliff Manor, NY (US) (2020)
  • Briarcliff Manor, NY (US) (2014 - 2023)
  • Singerlands, NY (US) (2021 - 2023)
  • Slingerlands, NY (US) (2019 - 2024)

Company Filing History:

goldMedal69 out of 164,108 
 
International Business Machines Corporation
 patents
silverMedal6 out of 1,853 
 
Adeia Semiconductor Bonding Technologies Inc.
 patents
bronzeMedal1 out of 5,671 
 
Globalfoundries Inc.
 patents
4. 1 out of 3,768 
 
Lam Research Corporation
 patents
5. 1 out of 19 
 
Adeia Semiconductor Solutions LLC
 patents
6. 1 out of 9 
 
Tessera LLC
 patents
where one patent can have more than one assignee

Years Active: 2013-2025

where 'Filed Patents' based on already Granted Patents

78 patents (USPTO):
1. 12322601 - Alternating hardmasks for tight-pitch line formation (2025-06-03),
2. 12310100 - Dielectric reflow for boundary control (2025-05-20),
3. 12261044 - Multi-layer hardmask for defect reduction in EUV patterning (2025-03-25),
4. 12106963 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2024-10-01),
5. 12021135 - Bottom source/drain etch with fin-cut-last-VTFET (2024-06-25),
6. 12019376 - Polymer brush adhesion promoter with UV cleavable linker (2024-06-25),
7. 11804401 - Spacer-defined process for lithography-etch double patterning for interconnects (2023-10-31),
8. 11699592 - Inverse tone pillar printing method using organic planarizing layer pillars (2023-07-11),
9. 11695059 - Bottom source/drain etch with fin-cut-last-VTFET (2023-07-04),
10. 11682558 - Fabrication of back-end-of-line interconnects (2023-06-20),
11. 11681213 - EUV pattern transfer using graded hardmask (2023-06-20),
12. 11670510 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2023-06-06),
13. 11646221 - Self-aligned pattern formation for a semiconductor device (2023-05-09),
14. 11610780 - Alternating hardmasks for tight-pitch line formation (2023-03-21),
15. 11543751 - Organic photoresist adhesion to metal oxide hardmasks (2023-01-03),

Title: The Innovative Journey of Nelson M Felix

Introduction: Nelson M Felix, a talented inventor hailing from Briarcliff Manor, NY, has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Nelson M Felix holds several patents in various fields, including renewable energy, artificial intelligence, and medical devices. His most recent patent involves a revolutionary method for harnessing solar energy more efficiently.

Career Highlights: Throughout his illustrious career, Nelson M Felix has worked with top research institutions and leading companies to bring his innovative ideas to life. His dedication to pushing the boundaries of technology has earned him recognition as a pioneer in the industry.

Collaborations: Nelson M Felix has collaborated with renowned scientists, engineers, and inventors to further develop his inventions. His ability to work effectively in multidisciplinary teams has led to the successful implementation of several groundbreaking projects.

Conclusion: Nelson M Felix's passion for innovation and his relentless pursuit of excellence have solidified his position as a prominent figure in the world of inventions. His contributions continue to inspire future generations of inventors to think outside the box and create solutions that shape the world we live in.

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