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For the Inventor, By the Inventor

Briarcliff Manor, NY, United States of America

Nelson M Felix

This inventor holds 79 USPTO granted patents and 9 published patent applications, primarily in Semiconductor Lithography (CPC class H01L). Top assignees: International Business Machines Corporation, Adeia Semiconductor Bonding Technologies Inc., Adeia Semiconductor Solutions LLC. Active years: 2013-2026.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Nelson M Felix. Retrieved from https://idiyas.com/inventor/nelson-m-felix

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

USPTO Granted Patents = 79 

% Patents Active = 72.2

Average Co-Inventor Count = 4.7

ph-index = 4

Forward Citations = 77(Granted Patents)

Forward Citations (Not Self Cited) = 40(Dec 10, 2025)


Inventors with similar research interests:


Location History:

  • Hopewell Junction, NY (US) (2013 - 2014)
  • Albany, NY (US) (2018 - 2019)
  • Braircliff Manor, NY (US) (2020)
  • Briarcliff Manor, NY (US) (2014 - 2023)
  • Singerlands, NY (US) (2021 - 2023)
  • Slingerlands, NY (US) (2019 - 2024)

Company Filing History:

goldMedal70 out of 166,351 
 
International Business Machines Corporation
 patents
silverMedal6 out of 1,909 
 
Adeia Semiconductor Bonding Technologies Inc.
 patents
bronzeMedal1 out of 30 
 
Adeia Semiconductor Solutions LLC
 patents
4. 1 out of 5,671 
 
Globalfoundries Inc.
 patents
5. 1 out of 3,945 
 
Lam Research Corporation
 patents
6. 1 out of 9 
 
Tessera LLC
 patents
where one patent can have more than one assignee

Years Active: 2013-2026

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Areas of Expertise:
EUV Patterning
Hardmask Technologies
Interconnect Fabrication
Tight-Pitch Line Formation
Self-Aligned Pattern Formation
Polymer Brush Adhesion
Multi-Layer Hardmask
Microfluidic Chips
Dielectric Reflow
Bottom Source/Drain Etch
Dynamic Adjustment
Overlay Metrology
79 patents (USPTO):Explore Patents
1. 12563817 - Integrating gate-cuts and single diffusion break isolation post-RMG using low-temperature protective liners (2026-02-24),
2. 12322601 - Alternating hardmasks for tight-pitch line formation (2025-06-03),
3. 12310100 - Dielectric reflow for boundary control (2025-05-20),
4. 12261044 - Multi-layer hardmask for defect reduction in EUV patterning (2025-03-25),
5. 12106963 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2024-10-01),
6. 12021135 - Bottom source/drain etch with fin-cut-last-VTFET (2024-06-25),
7. 12019376 - Polymer brush adhesion promoter with UV cleavable linker (2024-06-25),
8. 11804401 - Spacer-defined process for lithography-etch double patterning for interconnects (2023-10-31),
9. 11699592 - Inverse tone pillar printing method using organic planarizing layer pillars (2023-07-11),
10. 11695059 - Bottom source/drain etch with fin-cut-last-VTFET (2023-07-04),
11. 11682558 - Fabrication of back-end-of-line interconnects (2023-06-20),
12. 11681213 - EUV pattern transfer using graded hardmask (2023-06-20),
13. 11670510 - Self aligned pattern formation post spacer etchback in tight pitch configurations (2023-06-06),
14. 11646221 - Self-aligned pattern formation for a semiconductor device (2023-05-09),
15. 11610780 - Alternating hardmasks for tight-pitch line formation (2023-03-21),

Title: The Innovative Journey of Nelson M Felix

Introduction: Nelson M Felix, a talented inventor hailing from Briarcliff Manor, NY, has made significant contributions to the world of technology through his groundbreaking inventions and patents.

Latest Patents: Nelson M Felix holds several patents in various fields, including renewable energy, artificial intelligence, and medical devices. His most recent patent involves a revolutionary method for harnessing solar energy more efficiently.

Career Highlights: Throughout his illustrious career, Nelson M Felix has worked with top research institutions and leading companies to bring his innovative ideas to life. His dedication to pushing the boundaries of technology has earned him recognition as a pioneer in the industry.

Collaborations: Nelson M Felix has collaborated with renowned scientists, engineers, and inventors to further develop his inventions. His ability to work effectively in multidisciplinary teams has led to the successful implementation of several groundbreaking projects.

Conclusion: Nelson M Felix's passion for innovation and his relentless pursuit of excellence have solidified his position as a prominent figure in the world of inventions. His contributions continue to inspire future generations of inventors to think outside the box and create solutions that shape the world we live in.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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