Wei-Liang Lin

This inventor holds 68 USPTO granted patents and 3 published patent applications, primarily in Semiconductor Manufacturing (CPC class H01L). Top assignees: Taiwan Semiconductor Manufacturing Comp. Ltd., Macronix International Co., Ltd.. Active years: 2013-2026.

USPTO Granted Patents = 68 (Patent Applications = 3)

% Patents Active = 92.6

Average Co-Inventor Count = 6.1

ph-index = 6

Forward Citations = 113(Granted Patents)

Forward Citations (Not Self Cited) = 70(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Taipei, TW (2017 - 2023)
Hsin-Chu, TW (2013 - 2024)

Company Filing History:

62 out of 42,759

Taiwan Semiconductor Manufacturing Comp. Ltd.

patents

6 out of 3,609

Macronix International Co., Ltd.

patents

Years Active: 2013-2026

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Areas of Expertise:

Pattern Fidelity Enhancement

Directional Deposition

Semiconductor Devices

Memory Device

Fine Line Patterning

Critical Dimension Uniformity

3D Memory Device

Fin Patterning

High-Density Device

Selective Erase Scheme

NAND Flash Techniques

Fabrication Process

68 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12672946 - Method of making semiconductor device which includes Fins (2026-07-07),

2. 12334342 - Pattern fidelity enhancement (2025-06-17),

3. 12266539 - Method of manufacturing semiconductor devices (2025-04-01),

4. 12230507 - Method of manufacturing semiconductor devices using directional process (2025-02-18),

5. 12153350 - Method of manufacturing semiconductor devices (2024-11-26),

6. 12148653 - Method of manufacturing semiconductor devices (2024-11-19),

7. 12046293 - Memory device and method for operating selective erase scheme (2024-07-23),

8. 11955338 - Directional deposition for semiconductor fabrication (2024-04-09),

9. 11901190 - Method of patterning (2024-02-13),

10. 11901188 - Method for improved critical dimension uniformity in a semiconductor device fabrication process (2024-02-13),

11. 11881401 - Method of forming metal features (2024-01-23),

12. 11862465 - Fine line patterning methods (2024-01-02),

13. 11848208 - Method for forming semiconductor device structure (2023-12-19),

14. 11796922 - Method of manufacturing semiconductor devices (2023-10-24),

15. 11791161 - Pattern fidelity enhancement (2023-10-17),

Title: The Innovative Journey of Wei-Liang Lin

Introduction: Wei-Liang Lin, a pioneering inventor hailing from Hsinchu, Taiwan, has made significant contributions to the field of technology with his groundbreaking inventions and patents.

Latest Patents: Wei-Liang Lin's latest patents showcase his commitment to innovation and technological advancement, with a focus on areas such as semiconductor technology, renewable energy, and artificial intelligence.

Career Highlights: Throughout his illustrious career, Wei-Liang Lin has been at the forefront of technological innovation, working with leading research institutions and companies to develop cutting-edge solutions that have reshaped industries.

Collaborations: Wei-Liang Lin's collaborative efforts with top universities, research institutions, and tech companies have been instrumental in bringing his inventions to life and driving forward progress in the field of technology.

Conclusion: Wei-Liang Lin's passion for innovation, coupled with his dedication to pushing the boundaries of what is possible, has solidified his reputation as a visionary inventor whose work continues to inspire and shape the future of technology.