The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2018
Filed:
Mar. 26, 2015
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Todd C. Bailey, Poughkeepsie, NY (US);
Ioana C. Graur, Poughkeepsie, NY (US);
Scott D. Halle, Slingerlands, NY (US);
Marshal A. Miller, White Plains, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5009 (2013.01); G03F 7/70616 (2013.01); G03F 7/70625 (2013.01); G06F 17/5081 (2013.01);
Abstract
A photomask lithography simulation model is created for making a semiconductor chip. Poor metrology is filtered and removed from a contour-specific metrology dataset to improve performance of the photomask. Filtering is performed by the application of a weighting scheme.