Company Filing History:

31 out of 164,108

International Business Machines Corporation

Years Active: 1999-2019

where 'Filed Patents' based on already Granted Patents

35 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10386714 - Creating knowledge base for optical proximity correction to reduce sub-resolution assist feature printing (2019-08-20),

2. 10210292 - Process-metrology reproducibility bands for lithographic photomasks (2019-02-19),

3. 10042973 - Expansion of allowed design rule space by waiving benign geometries (2018-08-07),

4. 9928316 - Process-metrology reproducibility bands for lithographic photomasks (2018-03-27),

5. 9904757 - Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs) (2018-02-27),

6. 9690898 - Generative learning for realistic and ground rule clean hot spot synthesis (2017-06-27),

7. 9330225 - Photomask error correction (2016-05-03),

8. 9087739 - Pattern improvement in multiprocess patterning (2015-07-21),

9. 9034562 - Pattern improvement in multiprocess patterning (2015-05-19),

10. 8392871 - Decomposition with multiple exposures in a process window based OPC flow using tolerance bands (2013-03-05),

11. 8174681 - Calibration of lithographic process models (2012-05-08),

12. 8166423 - Photomask design verification (2012-04-24),

13. 8108804 - Short path customized mask correction (2012-01-31),

14. 8078995 - Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulations (2011-12-13),

15. 8059884 - Method and system for obtaining bounds on process parameters for OPC-verification (2011-11-15),

Title: Ioana C Graur: A Leading Innovator in Optical Proximity Correction

Introduction

Ioana C Graur, based in Poughkeepsie, NY, has established herself as a prominent inventor in the field of semiconductor technology. With an impressive portfolio of 35 patents, Graur's innovations primarily focus on improving the processes involved in photomask lithography and optical proximity correction.

Latest Patents

Among her latest patents are groundbreaking contributions that include the creation of a knowledge base for optical proximity correction aimed at reducing sub-resolution assist features (SRAF) printing. This patent outlines methods, program products, and systems for enhancing the fabrication of integrated circuits (IC) by predicting the presence of SRAF based on predictive algorithms and leveraging images from fabricated circuits for training data repositories. Another significant patent details the development of process-metrology reproducibility bands for lithographic photomasks, which involves creating a simulation model to optimize semiconductor chip production. By filtering out poor metrology data and implementing a weighting scheme, Graur's approach improves photomask performance.

Career Highlights

Graur's career highlights include her time working at major technology firms. She has made substantial contributions during her tenure at International Business Machines Corporation (IBM) and Globalfoundries Inc., where she collaborated on various innovative projects aimed at pushing the boundaries of semiconductor manufacturing technologies.

Collaborations

In her endeavors, Graur has collaborated with esteemed colleagues, including Lars W Liebmann and Scott Marshall Mansfield. These collaborations have enabled the exchange of ideas and advancements in the field, further solidifying the impact of her work on the industry.

Conclusion

Ioana C Graur's impressive array of patents and her continued pursuit of innovation underscore her vital role in enhancing semiconductor technologies. Her work not only addresses the challenges faced in photomask lithography but also paves the way for future advancements, showcasing the importance of inventors in shaping the technology landscape.

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