The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Apr. 30, 2010
Scott M. Mansfield, Hopewell Jct., NY (US);
Geng Han, Fishkill, NY (US);
Ioana C. Graur, Poughkeepsie, NY (US);
Scott M. Mansfield, Hopewell Jct., NY (US);
Geng Han, Fishkill, NY (US);
Ioana C. Graur, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Setting final dimensions while protecting against the possibility of merging shapes is provided by performing a decomposition of tolerance bands onto a plurality of masks for use in a multi-exposure process. This allows the maximum process latitude between open and short failure mechanisms, while also providing a mechanism to enforce strict CD tolerances in critical regions of a circuit. The decomposition enables co-optimizing various types of shapes placed onto each mask along with the source used to print each mask. Once the tolerance bands are decomposed onto the two or more masks, standard tolerance-band-based data preparation methodologies can be employed to create the final mask shapes.