Hopewell Junction, NY, United States of America

Scott Marshall Mansfield

This inventor holds 38 USPTO granted patents, primarily in Optical Proximity Correction. Top assignees: International Business Machines Corporation, Globalfoundries Inc., Infineon Technologies Ag. Active years: 1998-2019.


% Patents Active = 44.7

Average Co-Inventor Count = 3.3

ph-index = 12

Forward Citations = 1,119(Granted Patents)


Location History:

  • Hopewell Jct., NY (US) (2013)
  • Hopewell Junction, NY (US) (1998 - 2018)
  • Vestal, NY (US) (2016 - 2019)

Company Filing History:


Years Active: 1998-2019

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Areas of Expertise:
Optical Proximity Correction
Lithography Processes
Semiconductor Design
Photomask Design
Patterning Assist Features
Process Modeling
Mask Layout
Device Fabrication
Intermediate Range Flare Effects
Thermal Lensing Effects
Exposure Dose Adjustment
Double-Patterning Process
38 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Scott Marshall Mansfield

Introduction

Scott Marshall Mansfield, a prolific inventor based in Hopewell Junction, NY, has made significant contributions to the field of technology, amassing a total of 38 patents throughout his career. His work primarily focuses on methods that enhance data presentation and optimize manufacturing processes, showcasing his expertise in both software and hardware innovations.

Latest Patents

Among his latest patents is a groundbreaking method titled "Unifying real-time and static data for presenting over a web service." This innovative approach outlines the establishment of a persistent transmission control protocol (TCP) network connection between two computer processes. The method emphasizes dynamic memory allocation in response to static and dynamic data received, enabling a web server to present updated data effectively. Another notable patent, "Method of simultaneous lithography and etch correction flow," describes a dual-process model for mask correction that simultaneously optimizes lithographic and etch processes. By analyzing both models in an iterative loop, Mansfield has developed a common process window that enhances mask sizes and accounts for variations in three-dimensional photoresist profiles.

Career Highlights

Scott has had a distinguished career with significant tenures at renowned companies, including IBM and Globalfoundries Inc. His experiences have contributed to his deep understanding of the intersection between technology and manufacturing processes, allowing him to innovate solutions that improve operational efficiencies.

Collaborations

Throughout his career, Scott has worked alongside talented professionals, including Lars W. Liebmann and Ioana C. Graur. These collaborations have enriched his work and fostered a productive environment for inventive thinking, leading to numerous advancements in his field.

Conclusion

Scott Marshall Mansfield's contributions to technology through his innovative patents demonstrate his commitment to advancing the industry. His ability to blend software methodologies with hardware processes addresses complex challenges, making him a notable figure in the landscape of modern inventions.

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