The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 29, 2013
Filed:
Jan. 06, 2011
Zachary Baum, Gardiner, NY (US);
Henning Haffner, Pawling, NY (US);
Scott M. Mansfield, Hopewell Junction, NY (US);
Zachary Baum, Gardiner, NY (US);
Henning Haffner, Pawling, NY (US);
Scott M. Mansfield, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Infineon Technologies North America Corporation, Milpitas, CA (US);
Abstract
Aspects of the invention include a computer-implemented method of designing a photomask. In one embodiment, the method comprises: simulating a first photomask patterning process using a first photomask design to create simulated contours; comparing the simulated contours to a desired design; identifying regions not common to the simulated contours and the desired design; creating desired target shapes for a second photomask patterning process subsequent to the first photomask patterning process based upon the identified regions; and providing the desired target shapes for forming of a second photomask design based upon the desired target shapes.