The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 03, 2012
Filed:
Jan. 22, 2009
Maharaj Mukherjee, Wappingers Falls, NY (US);
James A. Culp, Downingtown, PA (US);
Lars Liebmann, Poughquag, NY (US);
Scott M. Mansfield, Hopewell Junction, NY (US);
Maharaj Mukherjee, Wappingers Falls, NY (US);
James A. Culp, Downingtown, PA (US);
Lars Liebmann, Poughquag, NY (US);
Scott M. Mansfield, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method is provided for designing a mask layout for an integrated circuit that ensures proper functional interaction among circuit features by including functional inter-layer and intra-layer constraints on the wafer. The functional constraints used according to the present invention are applied among the simulated wafer images to ensure proper functional interaction, while relaxing or eliminating the EPE constraints on the location of the wafer images.