The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jan. 31, 2012

Filed:

Jan. 19, 2009
Applicants:

Ioana Graur, Poughkeepsie, NY (US);

Scott M. Mansfield, Hopewell Junction, NY (US);

Inventors:

Ioana Graur, Poughkeepsie, NY (US);

Scott M. Mansfield, Hopewell Junction, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
Abstract

Embodiments of the present invention provide a method of performing photo-mask correction. The method includes identifying a hot-spot in a photo-mask that violates one or more predefined rules; creating a window area in the photo-mask that surrounds the hot spot; categorizing the window area; selecting a solution, from a library of pre-computed solutions, based on a category of the window area; and applying the solution to the hot spot. A service-oriented architecture (SOA) system that synchronizes the design to the process is also provided.


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