The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2018
Filed:
Dec. 31, 2015
Globalfoundries Inc., Grand Cayman, KY;
Amr Y. Abdo, Wappingers Falls, NY (US);
Ioana Graur, Poughkeepsie, NY (US);
GLOBALFOUNDRIES INC., Grand Cayman, KY;
Abstract
A processor receives an integrated circuit design, divides the integrated circuit design into a test portion and a remaining portion, and adds sub-resolution assist features (SRAFs) having different size and spacing parameters to the test portion of the integrated circuit design to generate a single test pattern. Exposure and development equipment performs a single exposure and development process of the single test pattern to produce a single test photoresist. The processor analyzes the single test photoresist to determine which of the size and spacing parameters are unacceptable and which are acceptable, based on differences between the single test photoresist and a model photoresist that the test portion of the integrated circuit design without the SRAFs would produce. The processor adds SRAFs having the acceptable size and spacing parameters to the remaining portion of the integrated circuit design.