Company Filing History:

3 out of 164,108

International Business Machines Corporation

Infineon Technologies Ag

patents

where one patent can have more than one assignee

Years Active: 2011-2020

where 'Filed Patents' based on already Granted Patents

6 patents (USPTO):Sort by Forward Citations

Abstract keywords

1. 10768521 - Extreme ultraviolet (EUV) mask absorber and method for forming the same (2020-09-08),

2. 9904757 - Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs) (2018-02-27),

3. 9405186 - Sample plan creation for optical proximity correction with minimal number of clips (2016-08-02),

4. 8443309 - Multifeature test pattern for optical proximity correction model verification (2013-05-14),

5. 8161421 - Calibration and verification structures for use in optical proximity correction (2012-04-17),

6. 7900169 - OPC model calibration process (2011-03-01),

Title: The Innovative Mind of Amr Y Abdo

Introduction

Amr Y Abdo is a notable inventor based in Wappingers Falls, NY, recognized for his contributions to the field of extreme ultraviolet (EUV) lithography. With a total of six patents to his name, Amr has significantly advanced technologies that play a vital role in semiconductor manufacturing.

Latest Patents

Among Amr's latest patents are the following:

1. **Extreme ultraviolet (EUV) mask absorber and method for forming the same**: This invention focuses on an EUV mask that includes an absorber structure with innovative designs, such as slanted and concave sidewalls. It details a method for forming this absorber by etching various layers to achieve specific structural properties. This process incorporates both isotropic and anisotropic etching, demonstrating Amr's expertise in developing advanced solutions.

2. **Test patterns for determining sizing and spacing of sub-resolution assist features (SRAFs)**: This patent outlines a method performed by a processor that enhances integrated circuit designs. By analyzing test patterns and adjusting parameters for SRAFs, Amr's methodology ensures improved outcomes in photolithography processes, enhancing the precision of semiconductor manufacturing.

Career Highlights

Amr Y Abdo has made significant contributions through his work at influential companies in the tech industry, including IBM and GlobalFoundries Inc. His roles in these organizations have been instrumental in pushing forward the boundaries of semiconductor technology.

Collaborations

Throughout his career, Amr has collaborated with esteemed colleagues including Ramya Viswanathan and Henning Haffner. These partnerships have been vital in fostering innovative ideas and fostering advancements in the field.

Conclusion

Amr Y Abdo’s extensive work in the semiconductor industry through his innovative patents marks him as a prominent figure in the field of lithography. His contributions, particularly regarding EUV technologies, pave the way for future advancements in semiconductor manufacturing, solidifying his legacy as a pioneering inventor.

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