The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2012
Filed:
Jul. 07, 2008
Ramya Viswanathan, Wappingers Falls, NY (US);
Amr Y. Abdo, Wappingers Falls, NY (US);
Henning Haffner, Pawling, NY (US);
Oseo Park, Hopewell Junction, NY (US);
Michael E. Scaman, Goshen, NY (US);
Ramya Viswanathan, Wappingers Falls, NY (US);
Amr Y. Abdo, Wappingers Falls, NY (US);
Henning Haffner, Pawling, NY (US);
Oseo Park, Hopewell Junction, NY (US);
Michael E. Scaman, Goshen, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Infineon Technologies AG, Neubiberg, DE;
Abstract
A method of training an Optical Proximity Correction (OPC) model comprises symmetrizing a complex design to be a test pattern having orthogonal symmetry. Symmetrizing may comprise establishing a axis of symmetry passing through the design, thereby dividing the design into two portions; deleting one of the two portions; and mirror-imaging the other of the two portions about the axis of symmetry. The design may be centered.