Oseo Park

Title: The Innovative Mind of Oseo Park

Introduction

Oseo Park, an accomplished inventor based in Hopewell Junction, NY, has made significant strides in the field of optical technology. With a keen understanding of design and functionality, he has been actively involved in developing advanced methodologies that enhance optical processes.

Latest Patents

Oseo Park holds a patent for "Calibration and verification structures for use in optical proximity correction." This innovative method involves training an Optical Proximity Correction (OPC) model by symmetrizing a complex design into a test pattern with orthogonal symmetry. The process includes establishing an axis of symmetry, dividing the design into two portions, deleting one, and mirror-imaging the other about the axis of symmetry. This technique ensures that the design can be effectively centered, which is critical for optimal performance in optical applications.

Career Highlights

Throughout his career, Oseo Park has worked with reputable companies such as IBM and Infineon Technologies AG. His experiences at these prominent organizations have allowed him to hone his skills and contribute meaningfully to the development of innovative optical technologies.

Collaborations

Oseo Park has collaborated with talented professionals in the tech industry, including Ramya Viswanathan and Amr Y Abdo. These partnerships have enabled him to leverage diverse expertise, leading to advancements in his field and fostering innovation.

Conclusion

Oseo Park's contributions to optical technology through his patent and collaborations mark him as a noteworthy inventor in the industry. His ability to simplify complex designs and enhance optical processes demonstrates his innovative spirit and commitment to advancing technology.