The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2011

Filed:

Nov. 08, 2007
Applicants:

Maharaj Mukherjee, Wappingers Falls, NY (US);

Ioana Graur, Poughkeepsie, NY (US);

Alan E. Rosenbluth, Yorktown Heights, NY (US);

Inventors:

Maharaj Mukherjee, Wappingers Falls, NY (US);

Ioana Graur, Poughkeepsie, NY (US);

Alan E. Rosenbluth, Yorktown Heights, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/20 (2006.01);
U.S. Cl.
CPC ...
Abstract

Embodiments of the present invention provide a method of performing printability verification of a mask layout. The method includes creating one or more tight clusters; computing a set of process parameters associated with a point on said mask; comparing said set of process parameters to said one or more tight clusters; and reporting an error when at least one of said process parameters is away from said one or more tight clusters.


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