The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Aug. 07, 2018

Filed:

Sep. 30, 2016
Applicant:

Globalfoundries Inc., Grand Cayman, KY;

Inventors:

Ioana C. Graur, Poughkeepsie, NY (US);

Dmitry Vengertsev, Boise, ID (US);

Assignee:

GLOBALFOUNDRIES Inc., Grand Cayman, KY;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5081 (2013.01); G06F 2217/12 (2013.01);
Abstract

Systems, methods, and computer program products for design rules checking in which the waiver of design rules is optimized while ensuring compliant designs that are manufacturable. A first design rule and a plurality of patterns of a layout that violate the first design rule are received by a design rule waiver system. The design rule waiver system may process the first design rule to extract a plurality of descriptors that can be perturbed. The design rule waiver system may perturb an attribute associated with at least one of the plurality of descriptors extracted from the first design rule in order to define a second design rule that is satisfied by the plurality of patterns.


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