Company Filing History:
Years Active: 2013-2016
Title: Innovations of Vinayan C Menon
Introduction
Vinayan C Menon is an accomplished inventor based in Hopewell Junction, NY (US). He holds a total of 3 patents that showcase his expertise in advanced process control systems and lithography techniques. His innovative contributions have significantly impacted the field of semiconductor manufacturing.
Latest Patents
One of his latest patents is titled "Alignment data based process control system." This invention focuses on determining the deformation of a substrate due to various processing steps by measuring substrate alignment data at lithographic processing steps before and after these steps. The system identifies any abnormal patterns in the alignment data differential by comparing it with previously accumulated data in a database. This allows for the identification of processing steps that introduce anomalies, enabling appropriate process control measures to rectify any issues.
Another notable patent is "Alignment marks for multi-exposure lithography." This invention involves a plurality of reticles for printing structures at the same lithography level, which includes an alignment structure pattern in the same relative location across each reticle. The process segmentations in one reticle are shifted relative to those in another by a fraction of a reticle segmentation pitch. This innovation allows for a composite printed process segmentation structure on the substrate, facilitating alignment for the next level in a single operation.
Career Highlights
Vinayan has worked with prominent companies such as IBM and Globalfoundries Inc. His experience in these leading organizations has contributed to his development as a skilled inventor in the semiconductor industry.
Collaborations
Throughout his career, Vinayan has collaborated with notable professionals, including Allen H Gabor and Christopher P Ausschnitt. These collaborations have further enriched his work and innovations.
Conclusion
Vinayan C Menon is a distinguished inventor whose patents reflect his significant contributions to the field of semiconductor manufacturing. His innovative solutions continue to advance the industry and demonstrate his expertise in process control and lithography.