The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Jul. 18, 2023

Filed:

Oct. 12, 2020
Applicants:

Asml Holding N.v., Eindhoven, NL;

Asml Netherlands B.v., Eindhoven, NL;

Inventors:

Ali Alsaqqa, Trumbull, CT (US);

Fadi El-Ghussein, Holmdel, NJ (US);

Lambertus Gerardus Maria Kessels, Clifton Park, NY (US);

Roxana Rezvani Naraghi, Easton, CT (US);

Krishanu Shome, Cheshire, CT (US);

Timothy Allan Brunner, Ridgefield, CT (US);

Sergei Sokolov, Eindhoven, NL;

Assignees:

ASML Holding N.V., Veldhoven, NL;

ASML Netherlands B.V., Veldhoven, NL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7019 (2013.01); G03F 9/7076 (2013.01);
Abstract

A calibration system includes a plate, a fixed alignment mark, and a variable diffraction grating. The plate is adjacent to a wafer alignment mark disposed on a wafer. The fixed alignment mark is disposed on the plate and is configured to act as a reference mark for an initial calibration of the calibration system. The variable diffraction grating is disposed on the plate and includes a plurality of unit cells configured to form a plurality of variable alignment marks. The variable diffraction grating is configured to calibrate a shift-between-orders of one of the variable alignment marks and the fixed alignment mark.


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