The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jul. 07, 2015
Filed:
Jun. 26, 2013
Applicant:
Mentor Graphics Corporation, Wilsonville, OR (US);
Inventors:
Timothy A. Brunner, Ridgefield, CT (US);
Stephen E. Greco, Lagrangeville, NY (US);
Bernhard R. Liegl, Beacon, NY (US);
Hua Xiang, Ossining, NY (US);
Assignee:
Mentor Graphics Corporation, Wilsonville, OR (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 17/50 (2006.01); G03F 1/00 (2012.01); G03F 1/36 (2012.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
G06F 17/5045 (2013.01); G03F 1/144 (2013.01); G03F 1/36 (2013.01); G03F 7/705 (2013.01);
Abstract
A system and method is provided which predicts problematic areas for lithography in a circuit design, and more specifically, which uses modeling data from a modeling tool to accurately predict problematic lithographic areas. The method includes identifying surface heights of plurality of tiles of a modeled wafer, and mathematically mimicking a lithographic tool to determine best planes of focus for exposure for the plurality of tiles.