The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Aug. 30, 2011
Javier J. Perez, Wappingers Falls, NY (US);
Dario L. Goldfarb, Dobbs Ferry, NY (US);
Ranee W. Kwong, Wappingers Falls, NY (US);
Libor Vyklicky, Yorktown Heights, NY (US);
Javier J. Perez, Wappingers Falls, NY (US);
Dario L. Goldfarb, Dobbs Ferry, NY (US);
Ranee W. Kwong, Wappingers Falls, NY (US);
Libor Vyklicky, Yorktown Heights, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An adhesion promoter layer is formed on a surface of a substrate as an adhesion promoter layer, on which a photoresist is applied. The photoresist is lithographically exposed. Soluble portions of the lithographically exposed photoresist are dissolved in a developer solution including tetraalkylammonium hydroxide. Tetraalkylammonium hydroxide salts are formed in crystalline forms on surfaces of the substrate. A water-soluble acidic polymer layer is applied over the surfaces of the substrate to dissolve the tetraalkylammonium hydroxide salts. The water-soluble acidic polymer layer is rinsed off by water, thereby providing clean surfaces that do not include the tetraalkylammonium hydroxide salts on the substrate. Subsequent processes can be performed on the substrate, which is covered by remaining portions of the developed photoresist and has clean surfaces in regions not covered by the photoresist.