The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 02, 2014
Filed:
Feb. 23, 2013
International Business Machines Corporation, Armonk, NY (US);
Jsr Corporation, Tokyo, JP;
Robert D. Allen, San Jose, CA (US);
Ramakrishnan Ayothi, San Jose, CA (US);
Luisa D. Bozano, Los Gatos, CA (US);
William D. Hinsberg, Fremont, CA (US);
Linda K. Sundberg, Los Gatos, CA (US);
Sally A. Swanson, San Jose, CA (US);
Hoa D. Truong, San Jose, CA (US);
Gregory M. Wallraff, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
JSR Corporation, Tokyo, JP;
Abstract
Provided is a method for developing positive-tone chemically amplified resists with an organic developer solvent having at least one polyhydric alcohol, such as ethylene glycol and/or glycerol, alone or in combination with an additional organic solvent, such as isopropyl alcohol, and/or water. The organic solvent developed positive tone resists described herein are useful for lithography pattern forming processes; for producing semiconductor devices, such as integrated circuits (IC); and for applications where basic solvents are not suitable, such as the fabrication of chips patterned with arrays of biomolecules or deprotection applications that do not require the presence of acid moieties.