The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 05, 2013
Filed:
Oct. 08, 2009
Phillip Joe Brock, Sunnyvale, CA (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Robert Dennis Miller, San Jose, CA (US);
Alshakim Nelson, Fremont, CA (US);
Jitendra Singh Rathore, Campbell, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
Phillip Joe Brock, Sunnyvale, CA (US);
Qinghuang Lin, Yorktown Heights, NY (US);
Robert Dennis Miller, San Jose, CA (US);
Alshakim Nelson, Fremont, CA (US);
Jitendra Singh Rathore, Campbell, CA (US);
Ratnam Sooriyakumaran, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Silsesquioxane polymers that cure to porous silsesquioxane polymers, silsesquioxane polymers that cure to porous silsesquioxane polymers in negative tone photo-patternable dielectric formulations, methods of forming structures using negative tone photo-patternable dielectric formulations containing silsesquioxane polymers that cure to porous silsesquioxane polymers, structures containing porous silsesquioxane polymers and monomers and method of preparing monomers for silsesquioxane polymers that cure to porous silsesquioxane polymers.