The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 27, 2009
Filed:
Aug. 04, 2006
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Wu-song Huang, Poughkeepsie, NY (US);
Margaret C. Lawson, LaGrangeville, NY (US);
Kaushal S. Patel, Wappingers Falls, NY (US);
Irene Popova, Beacon, NY (US);
Pushkara R. Varanasi, Poughkeepsie, NY (US);
Mahmoud Khojasteh, Poughkeepsie, NY (US);
Wu-Song Huang, Poughkeepsie, NY (US);
Margaret C. Lawson, LaGrangeville, NY (US);
Kaushal S. Patel, Wappingers Falls, NY (US);
Irene Popova, Beacon, NY (US);
Pushkara R. Varanasi, Poughkeepsie, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
The present invention discloses a composition suitable for use as a top antireflective coating and barrier layer for immersion lithography. The inventive composition is soluble in aqueous base solutions and insoluble in water. The inventive composition comprises a polymer having at least one hydrophobic moiety, at least one acidic moiety with a pKa of 1 or less, and at least one aqueous base soluble moiety. The present invention also discloses a method of forming a patterned layer on a substrate by using the inventive composition in lithography.