Newburgh, NY, United States of America

Randolph J Smith


Average Co-Inventor Count = 6.0

ph-index = 6

Forward Citations = 87(Granted Patents)


Location History:

  • Orange County, NY (US) (1996)
  • Newburgh, NY (US) (1994 - 2002)

Company Filing History:


Years Active: 1994-2002

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7 patents (USPTO):

Title: Innovations of Randolph J Smith

Introduction

Randolph J Smith is a notable inventor based in Newburgh, NY (US). He has made significant contributions to the field of semiconductor technology, holding a total of 7 patents. His work primarily focuses on photoresist compositions used in lithographic processes.

Latest Patents

One of his latest patents is a polymer-bound sensitizer, which is a photoresist composition designed for use in the fabrication of semiconductor devices, such as integrated circuit structures. This innovative photoresist composition includes a monomeric sensitizer that binds to a base-soluble long chain polymer. This advancement is crucial for improving the efficiency and effectiveness of lithographic processes in semiconductor manufacturing.

Career Highlights

Randolph J Smith is associated with the International Business Machines Corporation, commonly known as IBM. His role at IBM has allowed him to work on cutting-edge technologies and contribute to the advancement of semiconductor devices.

Collaborations

He has collaborated with notable coworkers, including Leo L Linehan and Wayne Martin Moreau, who have also contributed to the field of semiconductor technology.

Conclusion

Randolph J Smith's innovations in photoresist compositions have significantly impacted the semiconductor industry. His work continues to influence the development of integrated circuit structures, showcasing the importance of his contributions to technology.

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