The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 24, 2000
Filed:
Jun. 28, 1996
Applicant:
Inventors:
Premlatha Jagannathan, Patterson, NY (US);
Leo L Linehan, Walden, NY (US);
Wayne M Moreau, Wappinger Falls, NY (US);
Randolph J Smith, Newburgh, NY (US);
Assignee:
International Business Machines Corporation, Armonk, NY (US);
Primary Examiner:
Int. Cl.
CPC ...
G03F / ;
U.S. Cl.
CPC ...
4302701 ; 430905 ; 430910 ; 430915 ; 430922 ; 430926 ; 430927 ;
Abstract
A photoresist composition for use in lithographic processes in the fabrication of semiconductor devices such as integrated circuit structures is disclosed. The photoresist composition includes a monomeric sensitizer bounding to a base-soluble long chain polymer.
Jagannathan, Premlatha. (2000). Polymer-bound sensitizer (U.S. Patent No. 6136498). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6136498
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile