The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 1994
Filed:
Nov. 14, 1991
Applicant:
Inventors:
Christopher J Knors, Bound Brook, NJ (US);
Steve S Miura, Poughkeepsie, NY (US);
Melvin W Montgomery, New Windsor, NY (US);
Wayne M Moreau, Wappingers Falls, NY (US);
Randolph J Smith, Newburgh, NY (US);
Assignee:
International Business Machines Corporations, Armonk, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F / ; G03F / ;
U.S. Cl.
CPC ...
430192 ; 430165 ; 430191 ; 430193 ; 534557 ;
Abstract
Positive photoresist compositions and methods using the photoresist compositions for making submicron patterns in the production of semiconductor devices are disclosed. The photoresists contain sensitizers that are mixed naphthoquinonediazide 4- and 5- sulfonic acid esters of bis and tris(mono, di and trihydroxyphenyl) alkanes.