Poughkeepsie, NY, United States of America

Steve S Miura

This inventor holds 3 USPTO granted patents. Top assignee: International Business Machines Corporation. Active years: 1993-1994.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Steve S Miura. Retrieved from https://idiyas.com/inventor/steve-s-miura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile


% Patents Active = 100.0

Average Co-Inventor Count = 6.3

ph-index = 3

Forward Citations = 43(Granted Patents)


Location History:

  • Poughkeepsie, NY (US) (1993 - 1994)
  • Wappingers Falls, NY (US) (1994)

Company Filing History:


Years Active: 1993-1994

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3 patents (USPTO):Explore Patents

Title: Inventor Spotlight: Steve S. Miura

Introduction

Steve S. Miura is a notable inventor based in Poughkeepsie, NY, whose contributions to the field of semiconductor device fabrication have earned him recognition within the innovation community. With a total of three patents to his name, Miura's expertise lies in the development of advanced photoresist compositions that are crucial for the production of submicron patterns in semiconductor manufacturing.

Latest Patents

Miura's latest patents showcase his innovative approach to photoresist technology. One of his patents focuses on fast diazoquinone positive resists comprising mixed esters, specifically highlighting positive photoresist compositions and methods that utilize these formulations to create precise patterns in semiconductor devices. This innovation incorporates sensitizers that are mixed naphthoquinonediazide 4- and 5- sulfonic acid esters of bis and tris(mono, di and trihydroxyphenyl) alkanes.

Another significant patent involves the development of a silicon-containing positive resist intended for deep ultraviolet (DUV), x-ray, or electron-beam lithography. This resist is characterized by arylsilsesquioxane polymers equipped with acid-sensitive pendant groups that function as dissolution inhibitors, along with a photoacid generator to enhance photoresist performance.

Career Highlights

Steve S. Miura is a key contributor at International Business Machines Corporation (IBM), a leading technology company renowned for its pioneering work in computing and technological innovations. Through his role at IBM, Miura has played an integral part in advancing photoresist technologies, significantly impacting the semiconductor industry.

Collaborations

Throughout his career, Miura has collaborated with esteemed professionals like Melvin W. Montgomery and Harbans S. Sachdev. These partnerships have facilitated the exchange of ideas and fostered a collaborative environment that has led to groundbreaking advancements in the field of semiconductor fabrication.

Conclusion

Steve S. Miura's inventive spirit and contributions to semiconductor technology underscore the vital role that innovations play in the advancement of modern electronics. As he continues to develop new solutions for the challenges faced in semiconductor manufacturing, Miura remains a significant figure in the world of patents and inventions. His work not only reflects the impact of individual inventors on technological progress but also highlights the importance of collaboration within the industry.

Profile summary based on public USPTO records.
Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]
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