Kathleen M Cornett

Title: The Innovations of Kathleen M Cornett

Introduction

Kathleen M Cornett is a notable inventor based in Dutchess County, NY (US). She has made significant contributions to the field of photoresist compositions, particularly through her innovative work at IBM. Her expertise and dedication to her craft have led to the development of a unique patent that showcases her skills as an inventor.

Latest Patents

Kathleen holds a patent for a photoresist composition that includes a polyalkylmethacrylate co-polymer. This co-polymer, specifically poly(p-hydroxystyrene)-co-(methyl methacrylate), has been identified as an ideal blending partner in a novolak photoresist composition. The co-polymer is fully miscible with novolaks and exhibits high thermal stability, exceeding 150 degrees Celsius. This innovation is crucial for advancements in photoresist technology.

Career Highlights

Throughout her career, Kathleen has been associated with IBM, where she has contributed to various projects and innovations. Her work has not only advanced the field of photoresist compositions but has also positioned her as a respected figure in her industry.

Collaborations

Kathleen has collaborated with talented coworkers, including Judy B Dorn and Margaret C Lawson. These partnerships have fostered a creative environment that encourages innovation and the sharing of ideas.

Conclusion

Kathleen M Cornett's contributions to the field of photoresist compositions exemplify her dedication to innovation and excellence. Her patent and collaborations highlight her significant role in advancing technology at IBM.