International Business Machines Corporation

Pamela E Jones

Wayne Martin Moreau

Kevin Michael Welsh

Ratnam Sooriyakumaran

John Michael Cotte

Dario Leonardo Goldfarb

Robert Lavin Wood

Kenneth John McCullough

John Patrick Simons

Charles Jesse Taft

Keith Randal Pope

Christopher F Lyons

James Thomas Fahey

Gary T Spinillo

Robert R Dichiara

Robert David Allen

William D Hinsberg, Iii

Jr Conley

A composition which includes liquid or supercritical carbon dioxide and an acid having a pKa of less than about 4. The composition is employed in a process of removing residue from a precision surface, such as a semiconductor sample, in which the precision surface is contacted with the composition under thermodynamic conditions consistent with the retention of the liquid or supercritical carbon dioxide in the liquid or supercritical state.

Process of removing residue from a precision surface using liquid or supercritical carbon dioxide composition

Liquid or supercritical carbon dioxide composition

An antireflective coating composition for use with chemically amplified photoresist compositions comprising a polymer composition which is highly absorbent to mid and deep UV radiation, which is substantially inert to contact reactions with a chemically amplified photoresist composition, and which is insoluble in the developer for the chemically amplified photoresist composition.

Mid and deep-UV antireflection coatings and methods for use thereof

The present invention relates to a radiation-sensitive resist composition and the process for its use in the manufacture of integrated circuits. The composition comprises a radiation-sensitive acid generator, a binder soluble in aqueous base and an acrylate copolymer having acid labile pendant groups.

Radiation-sensitive resist composition and process for its use

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Bronx, NY, United States of America

Pamela E Jones