The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jan. 28, 2020
Filed:
May. 30, 2019
International Business Machines Corporation, Armonk, NY (US);
Cody John Murray, Scotia, NY (US);
Ekmini Anuja De Silva, Slingerlands, NY (US);
Alex Richard Hubbard, Rensselaer, NY (US);
Karen Elizabeth Petrillo, Voorheesville, NY (US);
Nelson Felix, Slingerlands, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of optimizing a lithographic process for semiconductor fabrication includes determining that a semiconductor wafer experienced a photoresist exposure delay. At least one operating parameter of a post exposure baking process is adjusted based on the semiconductor wafer having experienced the photoresist exposure delay. The post exposure baking process is performed on the semiconductor wafer utilizing the adjusted at least one operating parameter.