The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Jun. 03, 2005
Daniel A. Corliss, Hopewell Junction, NY (US);
Dario Gil, Pleasantville, NY (US);
Dario Leonardo Goldfarb, Mohegan Lake, NY (US);
Steven John Holmes, Guilderland, NY (US);
David Vaclav Horak, Essex Junction, VT (US);
Kurt Rudolf Kimmel, Waterford, NY (US);
Karen Elizabeth Petrillo, Mahopac, NY (US);
Dmitriy Shneyder, Hopewell Junction, NY (US);
Daniel A. Corliss, Hopewell Junction, NY (US);
Dario Gil, Pleasantville, NY (US);
Dario Leonardo Goldfarb, Mohegan Lake, NY (US);
Steven John Holmes, Guilderland, NY (US);
David Vaclav Horak, Essex Junction, VT (US);
Kurt Rudolf Kimmel, Waterford, NY (US);
Karen Elizabeth Petrillo, Mahopac, NY (US);
Dmitriy Shneyder, Hopewell Junction, NY (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method of forming an image in a photoresist layer. The method includes, providing a substrate; forming the photoresist layer over the substrate; forming a contamination gettering topcoat layer over the photoresist layer, the contamination gettering topcoat layer including one or more polymers and one or more cation complexing agents; exposing the photoresist layer to actinic radiation through a photomask having opaque and clear regions, the opaque regions blocking the actinic radiation and the clear regions being transparent to the actinic radiation, the actinic radiation changing the chemical composition of regions of the photoresist layer exposed to the radiation forming exposed and unexposed regions in the photoresist layer; and removing either the exposed regions of the photoresist layer or the unexposed regions of the photoresist layer. The contamination gettering topcoat layer includes one or more polymers, one or more cation complexing agents and a casting solvent.