The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 28, 2021
Filed:
Jun. 22, 2018
International Business Machines Corporation, Armonk, NY (US);
Yongan Xu, Niskayuna, NY (US);
Zhenxing Bi, Niskayuna, NY (US);
Yann Mignot, Slingerlands, NY (US);
Nelson Felix, Slingerlands, NY (US);
Ekmini A. De Silva, Slingerlands, NY (US);
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Abstract
A method of removing layers of an extreme ultraviolet (EUV) pattern stack is provided. The method includes forming one or more resist templates on an upper hardmask layer. The method further includes exposing portions of the surface of the upper hardmask layer to a dry etch process to produce modified and activated surfaces. The method further includes etching the modified and activated surfaces to expose an underlying organic planarization layer.