The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2022
Filed:
Jan. 22, 2019
Applicant:
International Business Machines Corporation, Armonk, NY (US);
Inventors:
Yann Mignot, Slingerlands, NY (US);
Yongan Xu, Niskayuna, NY (US);
Ekmini Anuja De Silva, Slingerlands, NY (US);
Ashim Dutta, Menands, NY (US);
Chi-Chun Liu, Altamont, NY (US);
Assignee:
INTERNATIONAL BUSINESS MACHINES CORPORATION, Armonk, NY (US);
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/033 (2006.01);
U.S. Cl.
CPC ...
H01L 21/0337 (2013.01); H01L 21/0332 (2013.01);
Abstract
A method of making a semiconductor device includes depositing an oxide material on a patterned mask arranged on a substrate. The method further includes removing a portion of the oxide material such that the patterned mask is exposed. The method also includes removing the patterned mask such that the substrate is exposed between areas of remaining oxide material.