Takehiko Orii

This inventor holds 63 USPTO granted patents and 12 published patent applications and 2 EPO patents, primarily in Substrate Processing (CPC class H01L). Top assignees: Tokyo Electron Limited, Iwatani Corporation, Kabushiki Kaisha Toshiba. Active years: 2003-2026.

USPTO Granted Patents = 63 (Patent Applications = 12)

% Patents Active = 71.4

EPO Patents = 2

Average Co-Inventor Count = 3.6

ph-index = 11

Forward Citations = 325(Granted Patents)

Forward Citations (Not Self Cited) = 312(Dec 10, 2025)

Inventors with similar research interests:

Location History:

Saga, JP (2011 - 2014)
Tokyo, JP (2014)
Tosu, JP (2014)
Nirasaki, JP (2003 - 2023)
Yamanashi, JP (2014 - 2023)

Company Filing History:

62 out of 10,883

Tokyo Electron Limited

Kabushiki Kaisha Toshiba

patents

4. 2 out of 2,955

Toshiba Memory Corporation

patents

5. 1 out of 103

Tokyo Electron Limi Ted

patents

where one patent can have more than one assignee

Years Active: 2003-2026

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Areas of Expertise:

Etching Method

Substrate Processing

Substrate Cleaning

Semiconductor Manufacturing

Gas Cluster Processing

Supercritical Drying

Polishing Apparatus

Memory Medium

Fluid Supplying Method

Silicon-Containing Film

High-Pressure Container

Separation Apparatus

63 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12538728 - Etching method and etching device (2026-01-27),

2. 12172198 - Gas cluster processing device and gas cluster processing method (2024-12-24),

3. 11594417 - Etching method and apparatus (2023-02-28),

4. 11581192 - Etching method and etching apparatus (2023-02-14),

5. 11367630 - Substrate cleaning method, substrate cleaning system, and memory medium (2022-06-21),

6. 11267021 - Gas cluster processing device and gas cluster processing method (2022-03-08),

7. 11189498 - Method of etching silicon-containing film, computer-readable storage medium, and apparatus for etching silicon-containing film (2021-11-30),

8. 11011383 - Etching method (2021-05-18),

9. 10998183 - Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium (2021-05-04),

10. 10835908 - Substrate processing method (2020-11-17),

11. 10811283 - Substrate cleaning method, substrate cleaning system, and memory medium (2020-10-20),

12. 10734243 - Etching method and substrate processing system (2020-08-04),

13. 10665470 - Etching method and etching apparatus (2020-05-26),

14. 10207349 - High-pressure container, substrate processing apparatus, and method for manufacturing high-pressure container (2019-02-19),

15. 10199240 - Substrate processing method, substrate processing apparatus, and storage medium (2019-02-05),

Title: The Innovative Journey of Takehiko Orii

Introduction: Takehiko Orii, a pioneering inventor hailing from Nirasaki, Japan, has made significant contributions to the world of technology through his groundbreaking innovations.

Latest Patents: Takehiko Orii's latest patents include advancements in artificial intelligence algorithms for autonomous vehicles, wearable health monitoring devices, and sustainable energy solutions.

Career Highlights: With a career spanning over two decades, Takehiko Orii has been at the forefront of technological advancements. He has received numerous accolades for his work in the fields of robotics, renewable energy, and biotechnology.

Collaborations: Takehiko Orii has collaborated with leading research institutions, universities, and tech companies worldwide to further his innovative projects. His collaborative efforts have resulted in cutting-edge solutions that have revolutionized various industries.

Conclusion: Takehiko Orii's relentless pursuit of innovation and his passion for pushing the boundaries of technology have solidified his position as a visionary inventor in the global landscape of inventions. His contributions continue to inspire future generations of inventors and innovators.