The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 17, 2020
Filed:
May. 24, 2018
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Assignee:
TOKYO ELECTRON LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05B 9/00 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); B05B 7/24 (2006.01); B05B 12/14 (2006.01); H01L 21/768 (2006.01); B05B 16/20 (2018.01); B05B 13/02 (2006.01);
U.S. Cl.
CPC ...
B05B 9/00 (2013.01); B05B 7/2497 (2013.01); B05B 12/14 (2013.01); B05B 16/20 (2018.02); H01L 21/02063 (2013.01); H01L 21/6715 (2013.01); H01L 21/76814 (2013.01); B05B 13/0228 (2013.01);
Abstract
Productivity can be improved. A substrate processing method includes a processing liquid supplying process of supplying a processing liquid, which contains a volatile component and forms a film on a substrate, onto the substrate on which a pre-treatment, which requires atmosphere management or time management after the pre-treatment, is performed; and an accommodating process of accommodating, in a transfer container, the substrate on which the processing liquid is solidified or cured by volatilization of the volatile component.