The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Jun. 21, 2022
Filed:
Aug. 31, 2020
Applicant:
Tokyo Electron Limited, Minato-ku, JP;
Inventors:
Miyako Kaneko, Nirasaki, JP;
Keiji Tanouchi, Nirasaki, JP;
Takehiko Orii, Nirasaki, JP;
Itaru Kanno, Minato-ku, JP;
Meitoku Aibara, Koshi, JP;
Satoru Tanaka, Koshi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Minato-ku, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); H01L 21/67 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67051 (2013.01); H01L 21/0206 (2013.01); H01L 21/02052 (2013.01); H01L 21/02057 (2013.01);
Abstract
A method for cleaning a substrate includes supplying to a substrate on which a resist layer is not formed a film-forming processing liquid which includes a volatile component and forms a film on the substrate, forming a processing film on the substrate by solidifying or curing the film-forming processing liquid supplied on the substrate, and supplying to the substrate having the processing film a strip-processing liquid which strips the processing film from the substrate.