Nirasaki, Japan

Keiji Tanouchi

USPTO Granted Patents = 13 

Average Co-Inventor Count = 4.4

ph-index = 3

Forward Citations = 23(Granted Patents)


Location History:

  • Yamanashi, JP (2018)
  • Nirasaki, JP (2010 - 2022)

Company Filing History:


Years Active: 2010-2025

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13 patents (USPTO):Explore Patents

Title: Keiji Tanouchi: Innovator in Substrate Cleaning Technologies

Introduction

Keiji Tanouchi is a prominent inventor based in Nirasaki, Japan. He has made significant contributions to the field of substrate cleaning technologies, holding a total of 13 patents. His innovative approaches have advanced the methods used in semiconductor manufacturing and other related industries.

Latest Patents

Tanouchi's latest patents include a substrate cleaning method, a substrate cleaning system, and a memory medium. One of his methods involves supplying a film-forming processing liquid to a substrate without a resist layer, which includes a volatile component that forms a film on the substrate. This process solidifies or cures the liquid, creating a processing film. Subsequently, a strip-processing liquid is applied to remove the processing film from the substrate. Another patent describes a similar method, where the volatile component is vaporized to solidify the film-forming processing liquid, followed by the application of a dissolving-processing liquid to dissolve the processing film.

Career Highlights

Keiji Tanouchi is associated with Tokyo Electron Limited, a leading company in the semiconductor equipment industry. His work has been instrumental in developing efficient cleaning methods that enhance the quality and performance of semiconductor devices.

Collaborations

Tanouchi has collaborated with notable coworkers, including Takehiko Orii and Makoto Muramatsu. Their combined expertise has contributed to the successful development of innovative cleaning technologies.

Conclusion

Keiji Tanouchi's contributions to substrate cleaning technologies have established him as a key figure in the semiconductor industry. His innovative patents and collaborative efforts continue to influence advancements in this critical field.

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