The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 11, 2017
Filed:
Mar. 28, 2013
Applicant:
Tokyo Electron Limited, Tokyo, JP;
Inventors:
Makoto Muramatsu, Koshi, JP;
Takahiro Kitano, Koshi, JP;
Tadatoshi Tomita, Koshi, JP;
Keiji Tanouchi, Nirasaki, JP;
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/32 (2006.01); G03B 27/54 (2006.01); G03F 7/40 (2006.01); H01L 21/027 (2006.01); H01L 21/033 (2006.01); H01L 21/311 (2006.01); H01L 21/67 (2006.01); B81C 1/00 (2006.01); G03F 7/20 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/40 (2013.01); B81C 1/00031 (2013.01); G03F 7/0002 (2013.01); G03F 7/2002 (2013.01); G03F 7/405 (2013.01); H01L 21/0271 (2013.01); H01L 21/0337 (2013.01); H01L 21/31133 (2013.01); H01L 21/6715 (2013.01); H01L 21/67109 (2013.01); H01L 21/67178 (2013.01); B81C 2201/0149 (2013.01); H01L 21/67115 (2013.01);
Abstract
The present invention is a pattern forming method of forming a pattern on a substrate using a block copolymer, the pattern forming method including the steps of: forming a film of a block copolymer containing at least two kinds of polymers on the substrate; heating the film of the block copolymer; irradiating the heated film of the block copolymer with ultraviolet light in an atmosphere of an inert gas; and supplying an organic solvent to the film of the block copolymer irradiated with the ultraviolet light.