The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Aug. 24, 2010
Filed:
Apr. 28, 2005
Applicants:
Mitsuaki Iwashita, Nirasaki, JP;
Satoru Shimura, Nirasaki, JP;
Keiji Tanouchi, Nirasaki, JP;
Inventors:
Assignee:
Tokyo Electron Limited, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/311 (2006.01);
U.S. Cl.
CPC ...
Abstract
A substrate treatment method which includes a developing step of developing a resist film on a substrate to form a resist pattern on the substrate, and thereafter includes an etching step of etching a base film using the resist pattern as a mask. The substrate treatment method, between the developing step and the etching step, supplies a fluorine-based liquid to the resist pattern to form a protection film with a high fluorine density on a surface of the resist pattern.