Satoru Shimura

This inventor holds 20 USPTO granted patents, primarily in Semiconductor Processing. Top assignees: Tokyo Electron Limited, Osaka University. Active years: 2002-2025.

IDiyas Innovation Intelligence. (2026). Inventor Profile: Satoru Shimura. Retrieved from https://idiyas.com/inventor/satoru-shimura

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Calculating rank

USPTO Granted Patents = 20

% Patents Active = 70.0

Average Co-Inventor Count = 3.2

ph-index = 5

Forward Citations = 516(Granted Patents)

Location History:

Yamanashi, JP (2012)
Nirasaki, JP (2002 - 2021)
Koshi, JP (2017 - 2021)

Company Filing History:

20 out of 10,933

Tokyo Electron Limited

where one patent can have more than one assignee

Years Active: 2002-2025

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Areas of Expertise:

Substrate Treatment

Film Forming

Semiconductor Device

Pattern Forming

Cleaning Apparatus

Coating Treatment

Memory Medium

Etching Method

Storage Medium

Manufacturing Apparatus

Wiring Formation

Processing Method

20 patents (USPTO):Sort by Forward CitationsExplore Patents

1. 12197129 - Substrate treatment method and substrate treatment system (2025-01-14),

2. 10998183 - Substrate cleaning apparatus, substrate cleaning system, substrate cleaning method and memory medium (2021-05-04),

3. 10964606 - Film forming system, film forming method, and computer storage medium (2021-03-30),

4. 10101669 - Exposure apparatus, resist pattern forming method, and storage medium (2018-10-16),

5. 10025190 - Substrate treatment system (2018-07-17),

6. 9741559 - Film forming method, computer storage medium, and film forming system (2017-08-22),

7. 9341952 - Substrate treatment method, non-transitory computer storage medium and substrate treatment system (2016-05-17),

8. 9329483 - Film forming method, non-transitory computer storage medium and film forming apparatus (2016-05-03),

9. 9280052 - Substrate treatment method, non-transitory computer storage medium and substrate treatment system (2016-03-08),

10. 8791030 - Coating treatment method and coating treatment apparatus (2014-07-29),

11. 8283253 - Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus (2012-10-09),

12. 8273661 - Pattern forming method, semiconductor device manufacturing method and semiconductor device manufacturing apparatus (2012-09-25),

13. 8202682 - Method of manufacturing semiconductor device, and resist coating and developing system (2012-06-19),

14. 8075730 - Apparatus for manufacturing a semiconductor device (2011-12-13),

15. 8037890 - Substrate cleaning device and substrate cleaning method (2011-10-18),

Title: Innovations by Satoru Shimura: Pioneering Substrate Treatment Technologies

Introduction

Satoru Shimura, an esteemed inventor based in Nirasaki, Japan, has made significant contributions to the field of substrate treatments with a total of 20 patents to his name. His innovative approaches have provided advancements in substrate cleaning and treatment technologies, which are vital to various industries, particularly in semiconductor manufacturing.

Latest Patents

Among his latest innovations are two patents that focus on substrate treatment methods and systems. The first patent describes a substrate treatment method that involves determining which of two treatment options to apply—either decreasing or increasing the polarity of a base film on a substrate. This determination is critical before applying a resist solution, allowing for optimal adhesion and functionality. The second patent outlines a comprehensive substrate cleaning apparatus, method, and system that utilizes a cleaning chamber to apply a treatment solution, creating a treatment film on the substrate's surface. This method emphasizes the importance of both the volatile components and a subsequent removal solution to ensure complete substrate cleanliness.

Career Highlights

Satoru Shimura has had a remarkable career, having worked with prominent organizations such as Tokyo Electron Limited and Osaka University. His experience at these institutions has been instrumental in shaping his expertise in substrate technologies and innovations.

Collaborations

Throughout his career, Shimura has collaborated with several talented individuals, including Fumiko Iwao and Kousuke Yoshihara. Their synergistic efforts have contributed to the development of groundbreaking technologies in substrate treatment and cleaning, enhancing the effectiveness of semiconductor manufacturing processes.

Conclusion

Satoru Shimura's contributions to the field of substrate treatment through his innovative patents exemplify the importance of research and development in advancing technological solutions. His work not only enhances manufacturing processes but also paves the way for future innovations in the industry. As he continues to develop his ideas, the impact of his inventions will undoubtedly be felt in various applications for years to come.

Profile summary based on public USPTO records.

Data Sources: USPTO Patent Grant XML, Patent Center, EPO & CIPO • Normalized by IDiyas Innovation Graph. Methodology & provenance architecturePlease report any incorrect information to [email protected]