The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Sep. 25, 2012
Filed:
Feb. 13, 2009
Hidetami Yaegashi, Yamanashi, JP;
Satoru Shimura, Yamanashi, JP;
Hidetami Yaegashi, Yamanashi, JP;
Satoru Shimura, Yamanashi, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
Provided is a pattern forming method for forming a pattern serving as a mask, which includes: a process for forming a first patternmade of a photoresist; a process for forming a boundary layerat sidewall portions and top portions of the first pattern; a process for forming a second mask material layerto cover a surface of the boundary layer; a process for removing a part of the second mask material layerto expose top portions of the boundary layer; a process for forming a second pattern made of the second mask material layerby etching and removing the boundary layer; and a trimming process for reducing a width of the first patternand a width of the second pattern to predetermined widths.