The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2011
Filed:
Aug. 25, 2006
Taro Yamamoto, Kumamoto-Ken, JP;
Hideharu Kyouda, Koshi, JP;
Tetsu Kawasaki, Nirasaki, JP;
Satoru Shimura, Nirasaki, JP;
Taro Yamamoto, Kumamoto-Ken, JP;
Hideharu Kyouda, Koshi, JP;
Tetsu Kawasaki, Nirasaki, JP;
Satoru Shimura, Nirasaki, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
A substrate cleaning device and a substrate cleaning method reduces liquid drops remaining on a substrate to prevent the irregular heating of the substrate by a heating process due to liquid drops or water marks remaining on the substrate. A cleaning liquid is poured through a cleaning liquid pouring nozzle onto the surface of a substrate such that a region onto which the cleaning liquid is poured moves from a central part toward the circumference of the substrate. A gas is jetted radially outward at a region on the surface of the substrate behind a region onto which the cleaning liquid is poured with respect to the rotating direction of the substrate. The gas forces a liquid film of the cleaning liquid flowing on the surface of the substrate to flow in a circumferential direction and a radially outward direction.