Koshi, Japan

Hideharu Kyouda



Average Co-Inventor Count = 3.5

ph-index = 6

Forward Citations = 112(Granted Patents)


Location History:

  • Kikuchi-gun, JP (2004 - 2006)
  • Kukuchi-gun, JP (2009)
  • Kikuyo-Machi, JP (2010)
  • Koshi, KR (2011)
  • Koshi, JP (2010 - 2021)
  • Kumamoto, JP (2002 - 2022)

Company Filing History:


Years Active: 2002-2022

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32 patents (USPTO):Explore Patents

Title: Innovations and Contributions of Hideharu Kyouda

Introduction

Hideharu Kyouda, a notable inventor based in Koshi, Japan, holds an impressive portfolio of 32 patents. His work primarily focuses on substrate processing technologies that have taken significant strides in enhancing the efficiency and accuracy of wafer processing.

Latest Patents

Among his latest innovations are the "Substrate processing apparatus," "substrate processing method," and "computer-readable recording medium." These advancements enable the precise determination of the end of polishing for each wafer, ensuring high accuracy. The comprehensive wafer processing method includes several stages: the acquisition of an initial processing state, the formation of a coating film, a polishing process using a specific polishing member, the assessment of the processed state, and finally, determining the result of the polishing operation, whether it be an end, insufficiency, or excess.

In addition, Kyouda has developed a "Liquid processing apparatus" designed for efficient liquid processing of substrates. This apparatus features multiple substrate holding units arranged side by side. It includes a nozzle that supplies processing fluid to substrates and is capable of moving to various positions to optimize the liquid processing procedure.

Career Highlights

Kyouda is currently employed with Tokyo Electron Limited, a prominent company in the semiconductor manufacturing and processing equipment sector. His contributions have significantly improved the efficiency and precision of wafer polishing and processing, reinforcing the company's reputation for innovation within the industry.

Collaborations

Throughout his career, Kyouda has collaborated with talented individuals, including Taro Yamamoto and Kousuke Yoshihara. Working alongside these peers has fostered a dynamic environment conducive to innovation and has further propelled advancements in the technologies they develop.

Conclusion

Hideharu Kyouda's contributions to substrate processing technology exhibit his innovative spirit and dedication to improving manufacturing processes. With a strong foundation of patents and successful collaborations, Kyouda continues to push the boundaries of technology, leaving a significant mark on the semiconductor industry.

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