The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Dec. 15, 2015
Filed:
Jul. 09, 2013
Applicant:
Tokyo Electron Limited, Minato-ku, JP;
Inventors:
Hideharu Kyouda, Koshi, JP;
Taro Yamamoto, Koshi, JP;
Assignee:
TOKYO ELECTRON LIMITED, Minato-ku, JP;
Primary Examiner:
Int. Cl.
CPC ...
B05C 11/02 (2006.01); H01L 21/67 (2006.01); G03F 7/11 (2006.01); G03F 7/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67017 (2013.01); G03F 7/11 (2013.01); G03F 7/168 (2013.01); G03F 7/2041 (2013.01); H01L 21/6715 (2013.01); H01L 21/67051 (2013.01);
Abstract
Disclosed is a technique for preventing a water-repellent protective film formed on a resist film from peeling off during immersion exposure. A resist film is formed on the front surface of a substrate and then the peripheral edge portion of the resist film is removed. Before forming a water-repellent protective film onto the resist film, an adhesion-improving fluid, preferably hexamethyldisilazane gas, for improving the adhesion of the water-repellent protective film, is supplied to the region from which the resist film is removed.