The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 21, 2013
Filed:
Feb. 10, 2011
Taro Yamamoto, Koshi, JP;
Kousuke Yoshihara, Koshi, JP;
Hideharu Kyouda, Koshi, JP;
Hirofumi Takeguchi, Koshi, JP;
Atsushi Ookouchi, Koshi, JP;
Taro Yamamoto, Koshi, JP;
Kousuke Yoshihara, Koshi, JP;
Hideharu Kyouda, Koshi, JP;
Hirofumi Takeguchi, Koshi, JP;
Atsushi Ookouchi, Koshi, JP;
Tokyo Electron Limited, Tokyo-To, JP;
Abstract
The temperature of a developing solution is varied depending on the type of resist or the resist pattern. The developing solution is applied while scanning a developer nozzle having a slit-shaped ejection port that has a length matching the width of the effective area of the substrate. After leaving the substrate with the developing solution being coated thereon for a predetermined period of time, a diluent is supplied while scanning a diluent nozzle, thereby substantially stopping the development reaction and causing the dissolved resist components to diffuse. A desired amount of resist can be quickly dissolved through the control of the developing solution temperature, while the development can be stopped before the dissolved resist components exhibit adverse effect through the supply of the diluent a predetermined timing, whereby achieving a pattern having a uniform line width and improved throughput.