Koshi, Japan

Atsushi Ookouchi


Average Co-Inventor Count = 4.2

ph-index = 3

Forward Citations = 47(Granted Patents)


Location History:

  • Kikuchi-gun, JP (2006 - 2010)
  • Kumamoto, JP (2004 - 2013)
  • Koshi, JP (2010 - 2023)

Company Filing History:


Years Active: 2004-2023

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17 patents (USPTO):Explore Patents

Title: **Atsushi Ookouchi: Innovator in Substrate Processing Technologies**

Introduction

Atsushi Ookouchi is an accomplished inventor based in Koshi, Japan, holding an impressive portfolio of 17 patents. His innovations primarily focus on substrate processing methods that are essential in the semiconductor manufacturing industry. With a commitment to advancing technology, Ookouchi continues to contribute significantly to the field.

Latest Patents

Among his latest patents, Ookouchi has developed a comprehensive substrate processing method, along with associated storage medium and substrate processing apparatus. This innovative method includes a first developing process that involves moving a nozzle with a discharge port into contact with a developer on the substrate's surface while rotating the substrate. The developer is discharged at a controlled flow rate. Following this, a second developing process discharges the developer at a higher flow rate while maintaining contact with the substrate, further refining the processing technique. These advancements are crucial for enhancing precision in semiconductor fabrication.

Career Highlights

Atsushi Ookouchi currently works at Tokyo Electron Limited, a prominent company known for its contributions to the semiconductor and electronics industry. His expertise and diverse experience have positioned him as a vital player in developing innovative solutions that meet the demands of modern technology.

Collaborations

Throughout his career, Ookouchi has collaborated with talented professionals such as Kousuke Yoshihara and Taro Yamamoto. These partnerships have not only enriched his work but also fostered a creative environment that encourages innovative thinking and problem-solving.

Conclusion

Atsushi Ookouchi's dedication to innovation in substrate processing is evident through his patents and collaboration efforts. His contributions are instrumental in pushing the boundaries of semiconductor manufacturing, showcasing the importance of continuous advancement in technology. With a strong foundation and a clear vision, Ookouchi is set to influence the industry further in years to come.

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