The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 05, 2010
Filed:
Aug. 11, 2005
Taro Yamamoto, Kikuchi-gun, JP;
Atsushi Ookouchi, Kikuchi-gun, JP;
Hirofumi Takeguchi, Kikuchi-gun, JP;
Kousuke Yoshihara, Kikuchi-gun, JP;
Taro Yamamoto, Kikuchi-gun, JP;
Atsushi Ookouchi, Kikuchi-gun, JP;
Hirofumi Takeguchi, Kikuchi-gun, JP;
Kousuke Yoshihara, Kikuchi-gun, JP;
Tokyo Electron Limited, Tokyo, JP;
Abstract
A developing apparatus for developing a substrate whose surface is coated with a coating solution and then exposed includes a substrate supporting unit for horizontally supporting the substrate, a rotation driving mechanism for rotating the substrate supporting unit forwardly or backwardly with respect to a vertical axis, a developer nozzle, disposed to face a surface of the substrate supported by the substrate supporting unit, having a strip-shaped injection opening extended along a direction extending from a periphery of the substrate toward a central portion thereof, a moving unit for moving the developer nozzle from an outer portion of the substrate toward the central portion thereof, and a controller for controlling operations such that while the substrate is rotated forwardly by the rotation driving mechanism, a developer is supplied through the injection opening to the surface of the substrate by moving the developer nozzle and, then, the substrate is rotated backwardly by the rotation driving mechanism.